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Photoresists

S1800 series resist: spin speed vs. film thickness

Photoresist: S1805
Storage: Wet bench - bay 2
Type: Positive
Thickness Range: 4.0 - 6.0kÅ
Product Data Sheet: PDS
MSDS: MSDS
Developer: MF 319 Dev, 351 Dev:H2O (1:5)

Photoresist: S1813
Storage: Wet bench - bay 2
Type: Positive
Thickness Range: 1.3 - 1.8µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: MF 319 Dev, 351 Dev:H2O (1:5)

Photoresist: S1818
Storage: Wet bench - bay 2
Type: Positive
Thickness Range: 1.7 - 2.6µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: MF 319 Dev, 351 Dev:H2O (1:5)

Photoresist: AZ 9260
Storage: Refrigerator - chase 2
Type: Positive
Thickness Range: 4.6 - 24µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: 1:4 AZ 400K:H2O
Process: 9µm, 38µm

Photoresist: LOR 3A
Storage: Wet bench - bay 2
Type: Lift-off
Thickness Range: 3.5 - 5.0kÅ
Product Data Sheet: PDS
MSDS: MSDS
Developer: MF CD 26
Process: S1813 LOR3A

Photoresist: LOR 20B
Storage: Wet bench - bay 2
Type: Lift-off
Thickness Range: 1.8 - 3.8µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: 1:4 AZ 400K:H2O
Process: S1813 LOR20B

Photoresist: Futurrex NR 71 1500P
Storage: Wet bench - bay 2
Type: Negative
Thickness Range: 1.1 - 3.1µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: Futurrex RD6
Process: Recipe, Speed vs. thickness

Photoresist: Futurrex NR 71 3000P
Storage: Wet bench - bay 2
Type: Negative (RIE/Ion mill)
Thickness Range: 2.1 - 6.3µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: Futurrex RD6
Remover: RR41 (PDS)
Process: Recipe, Speed vs. thickness

Photoresist: Futurrex NR9 1500 PY (discontinued)
Storage: Wet bench - bay 2
Type: Negative Lift-off
Thickness Range: 1.1 - 3.1µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: Futurrex RD6
Process: NR9-1500PY process

Photoresist: SU8 2010
Storage: Wet bench - bay 2
Type: Negative
Thickness Range: 10 - 20µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: SU8 Developer PM Acetate. SU8 Developer is not provided by the MNC
Process: Dilution Tips

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Aerosol and Particle Measurement Short Course
August 21-23, 2017

Are you interested in attending? Please see the flier for more information.

EverBeing
International Corporation

New Probe Station
MNC has installed a new probe station generously donated by EverBeing International Corporation headquartered in Taiwan. This new probe station will greatly enhance our capabilities in DC and low frequency electrical characterization, and will be located in Area 3 (1-132) in Keller Hall.

Inside the University of Minnesota's Minnesota Nano Center: Take a look inside the University of Minnesota's Minnesota Nano Center, a state of the art facility dedicated to the design, fabrication and testing of small-scale devices. Video produced by the Office of Business Relations, with assistance from the College of Science & Engineering.

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